PHOTO RESIST FOR LITHOGRAPHY & BLANKET COATINGS

Noel’s broad range of blanket coatings & Lithography resist options are available for specific application requirements:

  • Semiconductor
  • Bio-Medical & Life Sciences
  • MEMS

All of these applications have various feature sizes, resolution requirements that drive the type of resist, thickness of the resist, any etch requirements, lift-off of non-etch-able metals. Many variables that Noel has qualified and can run a project to meet a specific application requirement.

1um I Line for small features 500nm

10um I Line for larger features, deep etches

Lift-Off Resist

BiLayer Lift-Off Resist

3um Plating Resist that can define 1um features, plate 3-5um high features

20um Plating Resist that can define >10um features, plate 15um-20um high features

50um SU-8 for mold applications

RESISTNOMINAL THICKNESS RANGEWAVELENGTHTYPESTANDARD EBR
AR 3GSF-600600A to 800A248nm DUVAnti-Reflective Coat1mm
AZ 125nXT-10A35um t-60um365nm I LineNegative tone, Plating Resist1mm
AZ 125nXT-7A5um-20um365nm I LineNegative tone, Plating Resist1mm
AZ 12XT-20PL-055um-10um365nm I LinePositive Tone1mm
AZ nLoF 20202.5um365nm I LineNegative Tone, Lift-Off1mm
AZ nLoF 20355um365nm I LineNegative Tone, Lift-Off1mm
HD 40022um365nm I LineNegative Tone, Photo-Definable1mm
LOR 20A2um365nm I LineBi-Layer1mm
SPR 220-3.03.5um to 5um365nm I LinePositive Tone1mm
SPR 220-7.05um to 10um365nm I LinePositive Tone1mm
SPR 30122.5um to 3.8um365nm I LinePositive ToneStepper, Contact Print
SPR 955CM-0.71um365nm I LinePositive ToneStepper, Contact Print
SU-8 20021um to 2.5um365nm I LineNegative ToneStepper, Contact Print
SU-8 20052um to 5um365nm I LineNegative ToneStepper, Contact Print
SU-8 20105um to 10um365nm I LineNegative ToneStepper, Contact Print
SU-8 201510um to 25um365nm I LineNegative ToneStepper, Contact Print
SU-8 202525um to 50um365nm I LineNegative ToneStepper, Contact Print
SU-8 303550um to 75um365nm I LineNegative ToneStepper, Contact Print
TARF-P61111500A to 2000A193nmBlanket Coat Only
TARF-P70527000A193nmBlanket Coat Only
TARF-Pi6-144800A193nmBlanket Coat Only
UV 210GS-0.62um248nm DUVPositive ToneStepper
UV 6-0.87000A248nm DUVPositive ToneStepper
Notes:
1. Contact Noel for specific thickness requirements, bake conditions, EBR.
2. Noel validates the resist thickness via optical metrology to confirm the mean thickness range on silicon substrates on resist thickness <10um. On resist that is >10um a step height measurement is taken on silicon substrates.
3. For Lithography applications contact Noel for specific bake requirements, any subsequent etch requirements.