PVD Thin Film Metals

Noel operates 2 MRC Systems that provide 300mmand smaller diameter deposition of Titanium, Titanium Nitride, Chrome and Aluminum (99.999% Pure). Low Particle Processing utilizing a Vertical Palette Loading System. Used in Semiconductor, Bio-Medical, MEMS and many more applications.

Film Thickness

Ti200A to 3KA
TiN250A to 3KA
Al 500A to 2um
Cr250A to 3KA

Wafer Diameter:

50mm2 inch
100mm4 inch
125mm5 inch
150mm6 inch
200mm8 inch
300mm12 inch

Film thickness is measured on an Alpha Step or P-15 Profiler.