PVD Thin Film Metals
Noel operates 2 MRC Systems that provide 300mmand smaller diameter deposition of Titanium, Titanium Nitride, Chrome and Aluminum (99.999% Pure). Low Particle Processing utilizing a Vertical Palette Loading System. Used in Semiconductor, Bio-Medical, MEMS and many more applications.
Film Thickness
| Ti | 200A to 3KA |
| TiN | 250A to 3KA |
| Al | 500A to 2um |
| Cr | 250A to 3KA |
Wafer Diameter:
| 50mm | 2 inch |
| 100mm | 4 inch |
| 125mm | 5 inch |
| 150mm | 6 inch |
| 200mm | 8 inch |
| 300mm | 12 inch |
Film thickness is measured on an Alpha Step or P-15 Profiler.
