Noel offers Dielectric & Silicon Plasma Etch on 300mm, 200mm, 150mm & 100mm substrate sizes. Fluorine Based Chemistry, SF6, CF4, CHF3, Plasma O2, C4F8 etching Thermal Oxide, Deposited Oxide, LPCVD Nitride, and PECVD Nitride.
For more information, contact Noel Technologies.
