LITHOGRAPHY STEPPER

LITHOGRAPHY SERVICE I LINE 365nm Stepper

Noel’s broad Lithography capabilities include 4 Steppers & 2 Contact Aligners to accommodate many applications from manufacturing multiple chip on a wafer to single wafer devices.

Noel provides CAD & Layout services using customer supplied data files.

Noel offers a wide range of Photo Resist options. See Photo Resist Blanket Coatings.

STEPPER LITHOGRAPHY

XLS UltraTech Steppers XLS200, XLS100

200mm Semi Std Notch 725um +.-25um Silicon or Glass Substrates

Minimum Resolution =500nm (1um Photo Resist)

Wide Range of Photo Resist 1um to 10um 2X1 Aspect Ratio

Filed Size= Size 20mm X 20mm

GCA Stepper

200mm, 150mm, 100mm, Square Substrates

Minimum Resolution =1um

Wide Range of Photo Resist 1um to 10um

Field Size =15mm X 15mm

CONTACT PRINT LITHOGRAPHY

100mm, 150mm, 200mm & 300mm Silicon, Glass or other materials

Soda Lime or Quartz Masks Available

Minimum Feature:

100mm, 150mm & 200mm >2um

300mm >5um

Wide Range of Photo Resist 1um to 50um

Filed Size=Up to the entire wafer

Cross Section SEM Profiles available upon request.