Process development and fabrication up to 300mm
Noel Technologies facilities include:
- Class 100 clean rooms
- Wet labs & laboratories
- Metrology
- Polish
- CMP
- Particle Measurement
We are equipped for process development and fabrication with substrates sizes of 300mm (12 inch) to as small as 2-inch substrates. Noel Technologies also has capability to handle:
- Square substrates
- Quartz
- Borofloat
- Non-silicon substrates
- Coupons & Chiplets
Process tools available:
- Advanced Lithography Services:
- Lithography Tools:
- Thermal Oxide Furnaces
- LPCVD Deposition Systems: Nitride, Undoped Poly, Amorphous Silicon
- PECVD Deposition Systems
- PVD Thin Film Metals
- Plasma Etch Tools
- Extensive WET Etch Capability
- P-15 Profiler