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 Specialized Wet Process
By virtue of extensive, proprietary modifications, Noel has transformed a standard Universal Systems¹ wet process bench into a unique, efficient process solution. The modified wet process unit is designed to accommodate 12² wafers and features 0.04µ filtration in SC-1, SC-2 and oxide etch baths. The system uses an environmentally efficient, 0.00 net loss water recycling process. This unique system utilizes proprietary materials and techniques which virtually eliminates (¾1 x E10 atoms/cm2) metallic contamination.
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